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| In negative direct write using a resist, the laser writes a negative image of the desired circuit by ablating the resist over the spaces in the desired circuit pattern, leaving the pattern of circuit traces protected by the resist. | |||
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| Laser ablated etch resist in the first step of fabricating a circuit using negative direct write; trace pitch here is 30 um. | After ablation the exposed metal base layer is etched away, leaving the circuit traces, exposed after the protective layer of etch resist is removed. | ||
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