| Example of laser exposed photoresist on a test substrate. After laser exposure cross links the resist in the desired pattern, the unexposed resist is washed away. Chemical etching of the unprotected substrate removes the base metal layer, and the exposed resist is then removed, leaving the desired circuit traces. |
Positive direct write can be combined with conventional photolithography, improving laser throughput by direct writing only the fine details, while bulk circuit features are fabricated with more conventional methods, as shown in this prototype of an IC test interface. |
